Surface micromachining of a micro electromechanical inertial transducer based on commercially available Floating Gate Transistor technology

Authors

  • Griselda Stephany Abarca-Jiménez Unidad Profesional Interdisciplinaria de Ingeniería Campus Hidalgo–Instituto Politécnico Nacional
  • Gabriel Romero-Paredes Rubio Electrical Engineering Department CINVESTAV–IPN
  • Mario Alfredo Reyes-Barranca Electrical Engineering Department CINVESTAV–IPN
  • Miguel Ángel Alemán-Arce Centro de Nanociencias y Micro y Nanotecnologías-Instituto Politécnico Nacional
  • Jacobo Esteban Munguía-Cervantes Centro de Nanociencias y Micro y Nanotecnologías-Instituto Politécnico Nacional
  • Salvador Mendoza-Acevedo Centro de Nanociencias y Micro y Nanotecnologías-Instituto Politécnico Nacional http://orcid.org/0000-0002-6989-0406

DOI:

https://doi.org/10.47566/2018_syv31_1-030048

Keywords:

FGMOS, surface micromachining, inertial sensor

Abstract

This work presents the results of different surface micromachining processes done on a chip from On Semiconductor 0.5 µm commercially available CMOS technology. The intended objective is to fabricate a MEMS inertial transducer in a monolithic substrate, as the electronics for signal processing are based on a Floating Gate MOS transistor, fully integrated in the electromechanical structure. According to the available layers and design rules from the foundry, an inertial sensor chip was designed and fabricated, except the last post–processing step, i.e., the removal of the sacrificial layer and thus releasing the inertial structure based on a surface micromachining process, allowing the completed device to behave as designed.

References

. Z. Mohammed, G. Dushaq, A. Chatterjee, M. Rasras. IEEE 17th EuroSimE, 43 (2016).

https://doi.org/10.1109/EuroSimE.2016.7463335

. R.H. Han, J.Y. Wang, M.H. Xu, H. Guo, IEEE, SPAWDA 15 (2016).

https://doi.org/10.1109/SPAWDA.2016.7829958

. Y. Xu, L. Zhao, Z. Jiang, J. Ding, N. Peng, Y. Zhao, Sensors-Basel. 16, 210 (2016).

https://doi.org/10.3390/s16020210

. Z. Xudong, P. Thiruvenkatanathan, A.A. Seshia, J Microelectromech S. 23, 768 (2014).

https://doi.org/10.1109/JMEMS.2014.2319196

. O. Brand, in: CMOS-MEMS, Eds. H. Baltes, O. Brand, G.K. Fedder, C. Hierold, J.K. Korvink, O. Tabata (WILEY-VCH, 2005) pp. 1-67.

https://doi.org/10.1002/9783527616718

. M. Haris, Q. Hongwei, IEEE, NEMS 42 (2010).

https://doi.org/10.1109/NEMS.2010.5592224

. G.S. Abarca-Jiménez, M.A. Reyes-Barranca, S. Mendoza-Acevedo, J.E. Munguía-Cervantes, M.A. Alemán-Arce, Microsyst Technol. 22, 767 (2016).

https://doi.org/10.1007/s00542-015-2429-3

. G.S. Abarca Jiménez, M.A. Reyes Barranca, S. Mendoza Acevedo, J.E. Munguía Cervantes, M.A. Alemán Arce, Microsyst Technol. 21, 1353 (2015).

https://doi.org/10.1007/s00542-014-2274-9

. G.K. Fedder, IEEE, SENSORS. 37 (2005).

https://doi.org/10.1109/ICSENS.2005.1597652

. M.J. Madou, in: Manufacturing Techniques for Microfabrication and Nanotechnology, 3nd ed. (CRC-Press. 2011)

ISBN: 00209781420055191

https://www.crcpress.com/Manufacturing-Techniques-for-Microfabrication-and-Nanotechnology/Madou/p/book/9781420055191

. K.R. Williams, K. Gupta, M. Wasilik, J Microelectromech S. 12, 761 (2003).

https://doi.org/10.1109/jmems.2003.820936

. K.R. Williams, R. S. Muller, J Microelectromech S. 5, 256 (1996).

https://doi.org/10.1109/84.546406

. S. Wolf, R.N. Tauber, in: Silicon Processing for the VLSI Era: Process Technology, 2nd Ed. (Lattice. Press, 2000).

ISBN: 978-0-961-67216-4

https://openlibrary.org/works/OL14992745W/Silicon_Processing_for_the_VLSI_Era_Vol._1

. N.H. Ghazali, H. Soetedjo, N.A. Ngah, A. Yusof, A. Dolah, M.R. Yahya. IEEE International Conference on Semiconductor Electronics. 160 (2008).

https://doi.org/10.1109/SMELEC.2008.4770409

. S.A. Guerrera, A.I. Akinwande, Nanotechnology. 27, 295 (2016).

https://doi.org/10.1088/0957-4484/27/29/295302

Downloads

Published

2018-09-15

How to Cite

Abarca-Jiménez, G. S., Romero-Paredes Rubio, G., Reyes-Barranca, M. A., Alemán-Arce, M. Ángel, Munguía-Cervantes, J. E., & Mendoza-Acevedo, S. (2018). Surface micromachining of a micro electromechanical inertial transducer based on commercially available Floating Gate Transistor technology. Superficies Y Vacío, 31(3), 48–51. https://doi.org/10.47566/2018_syv31_1-030048

Issue

Section

Research Papers